EO nanosekundinis kietojo kūno lazeris EF40

EO (EdgeWave) laser EF40 function and role detailed explanation

EO EF40 is a high-power, high-repetition-rate nanosecond Q-switched solid-state laser that uses semiconductor pumping (DPSS) technology and is suitable for industrial precision machining, laser marking, micro-drilling and scientific research applications. Its core advantages lie in high pulse energy, excellent beam quality and long life design, which is particularly suitable for scenarios with high requirements for machining accuracy and stability.

1. Pagrindinės funkcijos

(1) High power & high pulse energy

Average power: 40 W (@1064 nm), some models can reach 60 W.

Single pulse energy: up to 2 mJ (depending on the repetition rate).

Repetition rate: 1–300 kHz (adjustable), to meet different processing requirements.

(2) Puiki spindulio kokybė

M² < 1.3 (close to the diffraction limit), small focus spot, concentrated energy.

Gaussian beam, suitable for high-precision micromachining.

(3) Lankstus pulso valdymas

Adjustable pulse width: 10–50 ns (typical value), optimizing the processing effect of different materials.

External trigger: supports TTL/PWM modulation, compatible with automatic control systems.

(4) Industrial-grade reliability

All-solid-state design (no lamp pump), life >20,000 hours.

Air cooling or water cooling optional, adapt to different working environments.

2. Pagrindinės taikymo sritys

(1) Precision micromachining

Cutting of brittle materials: glass, sapphire, ceramics (small thermal impact).

Micro drilling: PCB circuit boards, fuel nozzles, electronic components (high precision).

Thin film removal: solar cells, ITO conductive layer etching.

(2) Laser marking & engraving

Metal marking: stainless steel, aluminum alloy, titanium alloy (high contrast).

Plastic/ceramic engraving: no carbonization, clear edges.

(3) Scientific research and testing

LIBS (laser induced breakdown spectroscopy): high-energy pulse excitation plasma for elemental analysis.

Laser Radar (LIDAR): atmospheric detection, remote sensing ranging.

(4) Medical and beauty

Skin treatment: pigment removal, tattoo removal (532 nm model is better).

Dental applications: hard tissue ablation, teeth whitening.

3. Technical parameters (typical values)

Parameters EF40 (1064 nm) EF40 (532 nm, optional)

Wavelength 1064 nm 532 nm (doubled frequency)

Average power 40 W 20 W

Pulse energy 2 mJ (@20 kHz) 1 mJ (@20 kHz)

Repetition rate 1–300 kHz 1–300 kHz

Pulse width 10–50 ns 8–30 ns

Beam quality (M²) <1.3 <1.5

Cooling method Air cooling/water cooling Air cooling/water cooling

4. Comparison of competing products (EF40 vs. fiber/CO₂ laser)

Features EF40 (DPSS) Fiber laser CO₂ laser

Wavelength 1064/532 nm 1060–1080 nm 10.6 μm

Pulse energy High (mJ level) Lower (µJ–mJ) High (but with large thermal impact)

Beam quality M² <1.3 M² <1.1 M² ~1.2–2

Applicable materials Metal/non-metal Metal-based Non-metal (plastic/organic)

Maintenance requirements Low (lamp-free pumping) Very low Need to adjust gas/lens

5. Summary of advantages

High pulse energy: suitable for high-impact processing such as drilling and cutting.

Excellent beam quality: precision micromachining (M²<1.3).

Industrial-grade stability: all-solid-state design, long life, maintenance-free.

Multiple wavelengths available: 1064 nm (infrared) and 532 nm (green light) are available to adapt to different materials.

Applicable industries:

Electronic manufacturing (PCB, semiconductor)

Precision machining (glass, ceramics)

Scientific research experiments (LIBS, LIDAR)

Medical beauty (skin treatment, dentistry